美国ASTM D5127电子及半导体工业用纯水水质要求
美国ASTM D5127电子及半导体工业用纯水水质要求
项目 |
TypeE-1 |
TypeE-1.1 |
TypeE-1.2 |
TyPeE-2 |
TyPeE-3 |
TyPeE-4 |
线宽(μm) |
1.0-0.5 |
0.5-0.25 |
0.25-0.18 |
5-1 |
>5 |
- |
电阻率 |
18.2 |
18.2 |
18.2 |
17.5 |
12 |
0.5 |
热源(EU/ml) |
0.03 |
0.03 |
0.03 |
0.25 |
- |
- |
TOC(μg/L) |
5 |
2 |
1 |
50 |
300 |
1000 |
溶解氧DO(μg/L) |
1 |
1 |
1 |
- |
- |
- |
蒸发残渣(μg/L) |
1 |
0.5 |
0.1 |
- |
- |
- |
微粒(μm)(SEM检测) |
|
|
|
|
|
|
0.1—0.2 |
1000 |
1000 |
200 |
|
|
|
0.2—0.5 |
500 |
500 |
l00 |
3000 |
|
|
0.5—1.0 |
50 |
50 |
1 |
|
10000 |
|
10 |
- |
- |
- |
|
|
100000 |
微粒(μm)(在线检测) |
|
|
|
|
|
|
0.05—0.1 |
500 |
500 |
100 |
|
|
|
0.1—0.2 |
300 |
300 |
50 |
|
|
|
0.2—0.3 |
50 |
50 |
20 |
|
|
|
0.3—0.5 |
20 |
20 |
10 |
|
|
|
>0.5 |
4 |
4 |
1 |
|
|
|
细菌 |
|
|
|
|
|
|
100ml Sample |
1 |
1 |
1 |
|
|
|
1L Sample |
1 |
1 |
0.1 |
10 |
10000 |
100000 |
硅(μm) |
|
|
|
|
|
|
总硅 |
3 |
0.5 |
0.5 |
10 |
50 |
1000 |
溶解硅 |
1 |
0.1 |
0.05 |
|
|
|
离子(μg/L) |
|
|
|
|
|
|
NH4 |
0.1 |
0.1 |
0.05 |
- |
- |
|
Br |
0.1 |
0.05 |
0.02 |
- |
- |
|
Cl |
0.l |
0.05 |
0.02 |
1 |
10 |
1000 |
F |
0.1 |
0.05 |
0.03 |
- |
- |
- |
N03 |
0.1 |
0.05 |
0.02 |
1 |
5 |
500 |
N02 |
0.l |
0.05 |
0.02 |
- |
- |
- |
P04 |
0.1 |
0.05 |
0.02 |
1 |
5 |
500 |
S04 |
0.1 |
0.05 |
0.02 |
1 |
5 |
500 |
Al |
0.05 |
0.02 |
0.005 |
- |
- |
- |
Ba |
0.05 |
0.02 |
0.001 |
- |
- |
- |
B |
0.05 |
0.02 |
0.005 |
- |
- |
- |
Ca |
0.05 |
0.02 |
0.002 |
- |
- |
- |
Cr |
0.05 |
0.02 |
0.002 |
- |
- |
- |
Cu |
0.05 |
0.02 |
0.002 |
1 |
2 |
500 |
Fe |
0.05 |
0.02 |
0.002 |
- |
- |
- |
Pb |
0.05 |
0.02 |
0.005 |
- |
- |
- |
Li |
0.05 |
0.02 |
0.003 |
- |
- |
- |
Mg |
0.05 |
0.02 |
0.002 |
- |
- |
- |
Mn |
0.05 |
0.02 |
0.002 |
- |
- |
- |
K |
0.05 |
0.02 |
0.002 |
1 |
2 |
500 |
K |
0.05 |
0.02 |
0.005 |
2 |
5 |
500 |
Na |
0.05 |
0.02 |
0.005 |
1 |
5 |
1000 |
Sr |
0.05 |
0.02 |
0.00l |
- |
- |
- |
zi |
0.05 |
0.02 |
0.002 |
1 |
5 |
500 |
兰州去离子水设备,兰州水处理设备,超纯水设备,医用GMP纯化水设备。银川纯水设备 纯水设备
- 上一篇:超纯水设备中EDI膜块的保养与使用方法 2020/9/24
- 下一篇:电子行业水质标准与半导体超纯水设备标准分析 2020/9/23